As complementary metal-oxide semiconductor (CMOS) is scaled down to achieve higher chip density, thin-film layers have been deposited iteratively. The poor film uniformity resulting from deposition or chemical mechanical planarization (CMP) significantly affects chip yield. Therefore, the development of novel fabrication processes to enhance film uniformity is required. In this context, high-pressure deuterium annealing (HPDA) is proposed to reduce the surface roughness resulting from the CMP. The HPDA is carried out in a diluted deuterium atmosphere to achieve cost-effectiveness while maintaining high pressure. To confirm the effectiveness of HPDA, time-of-flight secondary-ion mass spectrometry (ToF-SIMS) and atomic force microscopy (AFM) are employed. It is confirmed that the absorbed deuterium gas facilitates the diffusion of silicon atoms, thereby reducing surface roughness.
In this study, we proposed CMP-PLAs to replace the Al heat sinks as heat sink materials, and investigated heat dissipation characteristics of the LED lighting devices using them. The crystallinity of the proposed CMP-PLA heat sinks decreased with increasing carbon nanotube contents in CMP-PLA. However, the thermal conductivity was improved with the increase of the carbon nanotube contents. The heat dissipation characteristics of the LED lighting devices using CMP-PLA heat sinks was improved with increasing carbon nanotube contents in CMP-PLA. For the LED lighting devices using CMP-PLA heat sinks with 40% carbon nanotube contents, the initial temperature measured at the heat sink plate was 27℃, which increased as time, and it was saturated around 56℃ after an hour. The LED lighting devices using CMP-PLA heat sinks are expected to be functional materials that can reduce their weight and improve their electric properties, compared to those using existing Al heat sinks.
In this paper, the characteristics of a carbon nanotube composite heat sink proposed to replace the advanced Al heat sinks for LED lighting devices were studied. Proposed CMP-PLA heat sink was made by mixing 20∼70 wt% carbon nanotube, 20∼70 wt% bio-degradable polymer of melt-blended PLA (poly lactic acid) and PBS (poly butylene succinate) and PLA nucleating agents composed of the mixture of soybean oil and biotites, at 150∼220℃ with 1,000∼1,500 rpm. Optical and electric characteristics of 7.5W LED lighting devices using heat sinks with such prepared CMP-PLA were investigated. And, the properties of the heat, which was not released from the CMP-PLA type heat sinks, was also investigated. The color temperature of LED lighting devices using the CMP-PLA heat sinks was 5,956 K,which is x= 0.32 and y= 0.34 in the XY chromaticity, and the color rendering index was 75. The luminous flux and the luminous efficiency of LED lighting devices using the CMP-PLA heat sinks was 540.6 lm and 72.68 lm/W respectively. Measured initial temperature of the heat sinks was 27℃, and their temperature increased as time to be saturated at 52℃ after an hour.
Copper (Cu) had been attractive material due to its superior properties comparing to other metals such as aluminum or tungsten and considered as the best metal which can replace them as an interconnect metal in integrated circuits. CMP (Chemical Mechanical Polishing) technology enabled the production of excellent local and global planarization of microelectronic materials, which allow high resolution of photolithography process. Cu CMP is a complex removal process performed by chemical reaction and mechanical abrasion, which can make defects of its own such as a scratch, particle and dishing. The abrasive particles remain on the Cu surface, and become contaminations to make device yield and performance deteriorate. To remove the particle, buffing cleaning method used in post-CMP cleaning and buffing is the one of the most effective physical cleaning process. AE(Acoustic Emission) sensor was used to detect dynamic friction during the buffing process. When polishing is started, the sensor starts to be loaded and produces an electrical charge that is directly proportional to the applied force. Cleaning efficiency of Cu surface were measured by FE-SEM and AFM during the buffing process. The experimental result showed that particles removed with buffing process, it is possible to detect the particle removal efficiency through obtained signal by the AE sensor.
Effects of CMP Retaining Ring Material on the Performance of Wafer Polishing Ki-Won Park, Eun-young Kim, Dong-Sam Park Journal of the Korean Society of Manufacturing Process Engineers.2020; 19(3): 22. CrossRef
Effects of Insert Materials of Retaining Ring on Polishing Finish in Oxide CMP Ki-Won Park, Dong-Sam Park Journal of the Korean Society of Manufacturing Process Engineers.2019; 18(8): 44. CrossRef
Finite Element Analysis on Dynamic Viscoelasticity of CMP Polishing Pad Byeongjun Pak, Dasol Lee, Seonho Jeong, Hyunjin Kim, Haedo Jeong Journal of the Korean Society for Precision Engineering.2019; 36(2): 177. CrossRef
Combined Effects of PVA Brush Scrubbing Parameters and Processes on Post-CMP Cross-Contamination Kwang-Min Han, Sumit Kumar, Mir Jalal Khan, Jae-Hyeong Lee, Tae-Gon Kim, Jin-Goo Park ECS Journal of Solid State Science and Technology.2025; 14(4): 044013. CrossRef
Particle removal behavior of micropatterned pad buffing in post-CMP cleaning Hokyoung Jung, Youngwook Park, Hanchul Cho, Doyeon Kim, Taekyung Lee, Haedo Jeong, Hyoungjae Kim Materials Science in Semiconductor Processing.2025; 194: 109530. CrossRef
A Study on the Polishing Characteristics Using Floating Nozzle in Linear Roll CMP Chiho Lee, Haedo Jeong Journal of the Korean Society for Precision Engineering.2015; 32(7): 627. CrossRef
Statistical Analysis on Process Variables in Linear Roll-CMP Han Wang, Hyunseop Lee, Haedo Jeong Journal of the Korean Society of Tribologists and Lubrication Engineers.2014; 30(3): 139. CrossRef
Effect of Slurry Film Thickness Variation according to Spray Range Using Ultrasonic Spray Nozzle on Material Removal Rate Seongnyeong Heo, Seonho Jeong, Minji Kim, Youngwook Park, Haedo Jeong Journal of the Korean Society for Precision Engineering.2022; 39(9): 675. CrossRef
Statistical Analysis on Process Variables in Linear Roll-CMP Han Wang, Hyunseop Lee, Haedo Jeong Journal of the Korean Society of Tribologists and Lubrication Engineers.2014; 30(3): 139. CrossRef
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