Effect of Temperature on Polishing Properties in Oxide CMP

Young Jin Kim; Boum Young Park; Hyoung Jae Kim; Hae Do Jeong

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산화막 CMP에서 발생하는 온도가 연마특성에 미치는 영향

김영진, 박범영, 김형재, 정해도

Effect of Temperature on Polishing Properties in Oxide CMP

Young Jin Kim, Boum Young Park, Hyoung Jae Kim, Hae Do Jeong

J Electr Electron Mater 2008;21(2):93-98.
Published online: February 1, 2008

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Keywords: Oxide CMP, Single head kinematics, Temperature, Removal rate, Non-uniformity

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Effect of Temperature on Polishing Properties in Oxide CMP

J Electr Electron Mater. 2008;21(2):93-98. Published online February 1, 2008

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Effect of Temperature on Polishing Properties in Oxide CMP

J Electr Electron Mater. 2008;21(2):93-98. Published online February 1, 2008

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산화막 CMP에서 발생하는 온도가 연마특성에 미치는 영향

Effect of Temperature on Polishing Properties in Oxide CMP

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