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Cu CMP에서의 연마 균일성에 관한 기계적 해석

이현섭, 박범영, 정해도, 김형재

Mechanical Analysis on Uniformity in Copper Chemical Mechanical Planarization

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J Electr Electron Mater 2007;20(1):74-79.
Published online: January 1, 2007
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Mechanical Analysis on Uniformity in Copper Chemical Mechanical Planarization
J Electr Electron Mater. 2007;20(1):74-79.   Published online January 1, 2007
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Mechanical Analysis on Uniformity in Copper Chemical Mechanical Planarization
J Electr Electron Mater. 2007;20(1):74-79.   Published online January 1, 2007
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