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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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산화제 및 연마제 첨가를 통한 Nickel CMP 특성 개선 연구

최권우, 김남훈, 서용진, 이우선

Improvement of Chemical Mechanical Polishing (CMP) Performance of Nickel by Additions of Abrasive and Various Oxidizers

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J Electr Electron Mater 2005;18(7):605-609.
Published online: July 1, 2005
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Improvement of Chemical Mechanical Polishing (CMP) Performance of Nickel by Additions of Abrasive and Various Oxidizers
J Electr Electron Mater. 2005;18(7):605-609.   Published online July 1, 2005
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Improvement of Chemical Mechanical Polishing (CMP) Performance of Nickel by Additions of Abrasive and Various Oxidizers
J Electr Electron Mater. 2005;18(7):605-609.   Published online July 1, 2005
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