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"MOV"

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"MOV"

Evaluation of Flow Properties of Ceramic Powders Using Static and Dynamic Image Analysis Methods
Ye-won Moon, Hyo-dong Lee, Ji-hui Oh, Jin-ae Kim, Dong-won Lee, Jong-min Oh
J Korean Inst Electr Electron Mater Eng 2025;38(3):254-264.   Published online May 1, 2025
DOI: https://doi.org/10.4313/JKEM.2025.38.3.3
Ceramic powder is an important material used for various purposes in advanced industries, and the fundamental properties of ceramic powder such as particle size, particle size distribution, and flow properties play a decisive role in determining the quality and performance of the final product. In general, these properties have been evaluated through particle size and shape analysis. However, these methods have limitations in providing a comprehensive understanding phenomena related to powder flow, coagulation, and wear. Consequently, performance evaluation based on the analysis of powder flow properties has been increasingly adopted. Previously, flow properties were primarily assessed using funnel-based methods. However, these methods have limitations, as they are challenging to apply to powders smaller than a few micrometers or those with strong coagulation tendencies, and they also suffer from low reliability. To address these issues, this paper introduces a novel piece of equipment that measures flow properties using image analysis and presents various parameters for static and dynamic flow behavior based on this technique. The proposed equipment offers exceptional versatility, as it can be applied to all types of ceramic powders regardless of their size or shape. The principles and measurement methods of the equipment are demonstrated through static and dynamic image analysis of ceramic powders with varying sizes and shapes used as examples.
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Design and Fabrication of a Surge Generator with Coupling/Decoupling Networks
Nam-hoon Kim, Tae-ho Kang, Han-sin Shin, Gyung-suk Kil
J Korean Inst Electr Electron Mater Eng 2020;33(2):130-134.   Published online March 1, 2020
DOI: https://doi.org/10.4313/JKEM.2021.33.2.10
Metal oxide varistors (MOVs) protect circuits and devices from transient overvoltages in electric power systems. However, a MOV continuously deteriorates owing to manufacturing defects or repetitive protective operations from transient overvoltages. A deteriorated MOV may result in a short circuit or a line-ground accident. Previous studies focused on the analysis of deterioration mechanisms and condition diagnosis techniques for MOVs owing to their recent growth of use. An accelerated deterioration experiment under the same conditions in which a MOV operates is essential. In this study, we designed and fabricated a surge generator that can apply a surge current to a MOV connected to AC mains. The coupling network operates at a low impedance against the surge current from the surge generator and transfers the surge current to the MOV under test. It also acts as a high impedance against AC mains for the AC voltage not to be applied to the surge generator. The decoupling network operates at a high impedance against the surge current and blocks the surge current from AC mains. It also acts as a low impedance against AC mains for the AC voltage to be applied to the MOV under test. The prototype surge generator can apply the 8/20 us up to 15 kA on AC voltages in the approximate range of 110~450 V, and it fully operates on a LabVIEW-based program.
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Design of a Miniature Fuse with High Breaking Capacity and Load Life Using a Ceramic Powder of Extinguishing an Electric Arc
Chang Yong Kang, Sang Jun Jin, Ye Ji Lee, Jae Seo Youn, Seong Yeo Noh
J Korean Inst Electr Electron Mater Eng 2019;32(4):327-332.   Published online July 1, 2019
DOI: https://doi.org/10.4313/JKEM.2019.32.4.327
Recently, inverter control systems have attracted immense attention to increase the energy efficiency. However, such systems use repeated on/off high currents for linear operation control, instead of the prevalent step variable current control method. Hence, there arise concerns of personal and property damage, especially due to the durability, explosive characteristics, and operating speed of the fuse, which is responsible for safety and is one of the internal components using current control. Therefore, in this paper, we propose an IEC60127-4 SMD sub-miniature fuse, consisting of Ag-Cu alloys and ceramic powder for arc soothing. The IEC60127-4 SMD sub-miniature fuse has high durability and cut-off capacity, and operates safely in dangerous circumstances caused by the inverter control system.
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Enhancement of Transmittance and Adhesion of Flexible Display Adhesion Surface by Bubble Removing Process
Jungsoo Kim, Kyungsoo Jang, Cam Phu, Heejun Park, Donggi Shin, Younjung Lee, Junsin Yi
J Korean Inst Electr Electron Mater Eng 2018;31(5):330-334.   Published online July 1, 2018
DOI: https://doi.org/10.4313/JKEM.2018.31.5.330
With the development of the Internet of Things, the use of flexible displays has become widespread. In particular, the use of curved, bendable, and rollable displays is increasing. Flexible display production processes include various important components such as lamination material, flexible substrates, and adhesives. Among them, improvement of the lamination process comprises a large proportion of efforts for further development. In this paper, we attempt to improve the transmittance of the display substrate by performing a bubble removal process after adhesion. The transmittance of the glass substrate with the bubble removal process was 5~12% higher than that of the substrate without the bubble removal process. The fill-strength after the bubble removal process was improved by 21.4%, and the shear-strength was improved by 43.9%.

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  • Evolution of OLED Lamination Technology With Development of Display Form Factors
    Kwan‐Young Han, Ji‐Hoon Park
    Advanced Materials Technologies.2026;[Epub]     CrossRef
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MOVPE Growth of InP Epitaxial Layers From TBP
Choong Hyun Yoo
J Korean Inst Electr Electron Mater Eng 2011;24(10):775-778.   Published online October 1, 2011
DOI: https://doi.org/10.4313/JKEM.2011.24.10.775
TBP (tertiarybutylphosphine), a relatively new material for phosphorus, has been studied with EDMIn (ethyldimethylindium) as an indium source for the growth of InP by MOVPE (metalorganic vapor phase epitaxy). Mirror smooth and good crystalline InP layers were obtained at 500-600℃ with the TBP/EDMIn molar ratio as low as 21. The deposited InP layers are all n-type with the electron concentration in the range of (5-10)×10(16) cm-3, which is a lot higher than those from PH3. This high concentration is due presumably to the high concentration of donor impurities in TBP. And it has been found that the formation of adduct occurs between EDMIn and TBP at room temperature when the partial pressure of EDMIn in the reactant mixture is above 1×10(-2) Torr. The high concentration of impurities in TBP and the adduct formation between EDMIn and TBP are major obstacles in replacing PH3 and TMIn for the growth of device quality InP layers.
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Effect of Pad Thickness on Removal Rate and Within Wafer Non-Uniformity in Oxide CMP
Jae Hyun Bae, Hyun Seop Lee, Jae Hong Park, Hideaki Nishizawa, Masaharu Kinoshita, Hae Do Jeong
J Korean Inst Electr Electron Mater Eng 2010;23(5):358-363.   Published online May 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.5.358

Citations

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  • Effects of CMP Retaining Ring Material on the Performance of Wafer Polishing
    Ki-Won Park, Eun-young Kim, Dong-Sam Park
    Journal of the Korean Society of Manufacturing Process Engineers.2020; 19(3): 22.     CrossRef
  • Effects of Insert Materials of Retaining Ring on Polishing Finish in Oxide CMP
    Ki-Won Park, Dong-Sam Park
    Journal of the Korean Society of Manufacturing Process Engineers.2019; 18(8): 44.     CrossRef
  • Finite Element Analysis on Dynamic Viscoelasticity of CMP Polishing Pad
    Byeongjun Pak, Dasol Lee, Seonho Jeong, Hyunjin Kim, Haedo Jeong
    Journal of the Korean Society for Precision Engineering.2019; 36(2): 177.     CrossRef
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Removal of Photoresist Mask after the Cl2/HBr/CF4 Reactive Ion Silicon Etching
Tae Kyung Ha, Jong Chang Woo, Gwan Ha Kim, Chang Il Kim
J Korean Inst Electr Electron Mater Eng 2010;23(5):353-357.   Published online May 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.5.353
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Multi-directionally Movable Lambda Shape Transducer for Ultrasonic Motor
Young Soo Do, Hyo Duk Nam, Young Duk Kim
J Korean Inst Electr Electron Mater Eng 2008;21(2):131-136.   Published online February 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.2.131
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Effect of Temperature on Polishing Properties in Oxide CMP
Young Jin Kim, Boum Young Park, Hyoung Jae Kim, Hae Do Jeong
J Korean Inst Electr Electron Mater Eng 2008;21(2):93-98.   Published online February 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.2.093
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Study on Controlling Oil Movement in Electro-wetting Display
Youn Sik Kim, Su Young Kim, Tae Hyun Kim, Eun Gyoung Song, Palanivelu Sureshkumar, Seung Hee Lee
J Korean Inst Electr Electron Mater Eng 2007;20(2):173-177.   Published online February 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.2.173
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A Study on Oxidizer Effects in Tungsten CMP
J Korean Inst Electr Electron Mater Eng 2005;18(9):787-792.   Published online September 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.9.787

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  • Effect of Oxidizer on the Polishing in Cadmium Telluride CMP
    Byeong Cheol Shin, Chang Suk Lee, Hae Do Jeong
    Journal of the Korean Society for Precision Engineering.2015; 32(1): 69.     CrossRef
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A Study on DOE Method to Optimize the Process Parameters for Cu CMP
J Korean Inst Electr Electron Mater Eng 2005;18(1):24-29.   Published online January 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.1.024

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  • Statistical Analysis on Process Variables in Linear Roll-CMP
    Han Wang, Hyunseop Lee, Haedo Jeong
    Journal of the Korean Society of Tribologists and Lubrication Engineers.2014; 30(3): 139.     CrossRef
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Planarization Characteristics of CMP for WO3 Film with an Addition of Oxidizers
J Korean Inst Electr Electron Mater Eng 2005;18(1):12-16.   Published online January 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.1.012
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A Study on CMP Properties of SnO2 Thin Film for Application of Gas Sensor
J Korean Inst Electr Electron Mater Eng 2004;17(12):1296-1300.   Published online December 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.12.1296
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Dry-etch Characteristics of InP/InGaAsP Photonic Crystal Structure
J Korean Inst Electr Electron Mater Eng 2004;17(12):1271-1276.   Published online December 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.12.1271
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Characteristics of Friction Affecting CMP Results
J Korean Inst Electr Electron Mater Eng 2004;17(10):1041-1048.   Published online October 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.10.1041

Citations

Citations to this article as recorded by  
  • Material Removal Mechanism of CMP Pad by CVD Conditioner Cutting Edges
    Jiho Shin, Jongmin Jeong, Yeongil Shin, Haedo Jeong
    Journal of the Korean Society for Precision Engineering.2026; 43(7): 671.     CrossRef
  • Effect of pad’s surface deformation and oscillation on monocrystalline silicon wafer surface quality
    Woong-Kirl Choi, Seong-Hyun Kim, Seung-Geon Choi, Eun-Sang Lee, Chul-Hee Lee
    International Journal of Precision Engineering and Manufacturing.2014; 15(11): 2301.     CrossRef
  • Evaluation of the wafer polishing pad capacity and lifetime in the machining of reliable elevations
    Eun-Sang Lee, Ji-Wan Cha, Seong-Hyun Kim
    International Journal of Machine Tools and Manufacture.2013; 66: 82.     CrossRef
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Role of Oxidants for Metal CMP Applications
Yong Jin Seo, Sang Yong Kim, U Seon Lee
J Korean Inst Electr Electron Mater Eng 2004;17(4):378-383.   Published online April 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.4.378
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Effects of Oxidizer Additive on the Performance of Copper-Chemical Mechanical Polishing using Tungsten Slurry
U Seon Lee, Gwon U Choe, Yeong Sig Lee, Yeon Og Choe, Yong Taeg O, Yong Jin Seo
J Korean Inst Electr Electron Mater Eng 2004;17(2):156-161.   Published online February 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.2.156
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Aging Effects of Silica Slurry and Oxide CMP Characteristics
U Seon Lee, Pil Ju Go, Yeong Sig Lee, Yong Jin Seo, Gwang Jun Hong
J Korean Inst Electr Electron Mater Eng 2004;17(2):138-143.   Published online February 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.2.138
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Characteristics of 2-Step CMP (Chemical Mechanical Polishing) Process using Reused Slurry by Adding of Silica Abrasives
Yong Jin Seo, Gyeong Jin Lee, Un Sig Choe, Sang Yong Kim, Jin Seong Park, U Seon Lee
J Korean Inst Electr Electron Mater Eng 2003;16(9):759-764.   Published online September 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.9.759
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Anodically Oxidized InP Schottky Diodes Grown Form EDMIn and TBP on GaAs Substrates
Choong Hyun Yoo
J Korean Inst Electr Electron Mater Eng 2003;16(6):471-476.   Published online June 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.6.471
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Effects of Mixed Oxidizer on the W-CMP Characteristics
Chang Jun Park, Yong Jin Seo, Sang Yong Kim, U Seon Lee
J Korean Inst Electr Electron Mater Eng 2003;16(12s):1181-1186.
DOI: https://doi.org/10.4313/JKEM.2003.16.12s.1181
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