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Cl2/HBr/CF4 반응성 이온 실리콘 식각 후 감광막 마스크 제거

하태경, 우종창, 김관하, 김창일

Removal of Photoresist Mask after the Cl2/HBr/CF4 Reactive Ion Silicon Etching

Tae Kyung Ha, Jong Chang Woo, Gwan Ha Kim, Chang Il Kim
J Electr Electron Mater 2010;23(5):353-357.
Published online: May 1, 2010
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Removal of Photoresist Mask after the Cl2/HBr/CF4 Reactive Ion Silicon Etching
J Electr Electron Mater. 2010;23(5):353-357.   Published online May 1, 2010
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Removal of Photoresist Mask after the Cl2/HBr/CF4 Reactive Ion Silicon Etching
J Electr Electron Mater. 2010;23(5):353-357.   Published online May 1, 2010
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