Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
Search
Advanced Search
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Page Path

10
results for

"Low-k"

Keywords

More +

Publication year

Authors

More +

"Low-k"

A Study of Optical Characteristics Correlated With Low Dielectric Constant of SiOCH Thin Films Through Ellipsometry
Yong Heon Park
J Korean Inst Electr Electron Mater Eng 2010;23(3):228-233.   Published online March 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.3.228
  • 50 View
  • 0 Download
Properties of SiOCH Thin Film Low Dielectric by BTMSM/O2 Flow Rates
In Cheol Park, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2009;22(2):132-136.   Published online February 1, 2009
DOI: https://doi.org/10.4313/JKEM.2009.22.2.132
  • 51 View
  • 0 Download
Properties of Dielectric Constant and Bonding Mode of Annealed SiOCH Thin Film
Jong Wook Kim, Chang Su Hwang, Yong Heon Park, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2009;22(1):47-52.   Published online January 1, 2009
DOI: https://doi.org/10.4313/JKEM.2009.22.1.047
  • 60 View
  • 0 Download
An Inspection of Stability for Annealing SiOCH Thin Flim
Yong Heon Park, Min Seok Kim, Chang Su Hwang, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2009;22(1):41-46.   Published online January 1, 2009
DOI: https://doi.org/10.4313/JKEM.2009.22.1.041
  • 62 View
  • 0 Download
A Study of the Dielectric Characteristics of the Low-k SiOCH Thin Films by Ellipsometry
In Hwan Yi, Chang Su Hwang, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2008;21(12):1083-1089.   Published online December 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.12.1083
  • 61 View
  • 0 Download
Dielectric Characteristics through 2D-correlation Analysis of SiOCH Thin Film deposited by BTMSM/O2 High Flow Rates
Min Seok Kim, Chang Su Hwang, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2008;21(6):544-551.   Published online June 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.6.544
  • 60 View
  • 0 Download
Properties of SiOCH Thin Film Dielectric constant by BTMSM/O2 Flow Rates
Jong Wook Kim, Chang Su Hwang, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2008;21(4):362-367.   Published online April 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.4.362
  • 51 View
  • 0 Download
Properties of SiOCH Thin Film Bonding Mode by BTMSM/O2 Flow Rates
Jong Wook Kim, Chang Su Hwang, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2008;21(4):354-361.   Published online April 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.4.354

Citations

Citations to this article as recorded by  
  • Properties of Dielectric Constant and Bonding Mode of Annealed SiOCH Thin Film
    Jong Wook Kim, Chang Su Hwang, Yong Heon Park, Hong Bae Kim
    Journal of Korean Institute of Electrical and Electronic Materials Engineers.2009; 22(1): 47.     CrossRef
  • 63 View
  • 0 Download
  • 1 Crossref
A Study on 013㎛ Cu/Low-k Process Setup and Yield Improvement
J Korean Inst Electr Electron Mater Eng 2007;20(4):325-331.   Published online April 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.4.325
  • 86 View
  • 0 Download
A Comparative Study on Cu Drift Diffusion of Low-k Dielectrics and Thermal Oxide by use of BTS Technique
J Korean Inst Electr Electron Mater Eng 2007;20(2):106-112.   Published online February 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.2.106
  • 52 View
  • 0 Download
First First Prev Prev
Page of 1
Next Next Last Last