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Ellipsometry를 이용한 Low-k SiOCH 박막의 유전특성에 관한 연구

이인환, 황창수, 김홍배

A Study of the Dielectric Characteristics of the Low-k SiOCH Thin Films by Ellipsometry

In Hwan Yi, Chang Su Hwang, Hong Bae Kim
J Electr Electron Mater 2008;21(12):1083-1089.
Published online: December 1, 2008
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A Study of the Dielectric Characteristics of the Low-k SiOCH Thin Films by Ellipsometry
J Electr Electron Mater. 2008;21(12):1083-1089.   Published online December 1, 2008
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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A Study of the Dielectric Characteristics of the Low-k SiOCH Thin Films by Ellipsometry
J Electr Electron Mater. 2008;21(12):1083-1089.   Published online December 1, 2008
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