Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
Search
Advanced Search
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

Page Path

BTMSM/O2 유량변화에 따른 SiOCH 박막의 유전상수 특성

김종욱, 황창수, 김홍배

Properties of SiOCH Thin Film Dielectric constant by BTMSM/O2 Flow Rates

Jong Wook Kim, Chang Su Hwang, Hong Bae Kim
J Electr Electron Mater 2008;21(4):362-367.
Published online: April 1, 2008
  • 5 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Full Article

Download PDF Download PDF

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Properties of SiOCH Thin Film Dielectric constant by BTMSM/O2 Flow Rates
J Electr Electron Mater. 2008;21(4):362-367.   Published online April 1, 2008
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
Format:
Include:
Properties of SiOCH Thin Film Dielectric constant by BTMSM/O2 Flow Rates
J Electr Electron Mater. 2008;21(4):362-367.   Published online April 1, 2008
Close

Related articles

ABOUT

BROWSE ARTICLES

EDITORIAL POLICIES

FOR CONTRIBUTORS

© The Korean Institute of Electrical and Electronic Materials Engineers.