Etch Characteristics of (Pb,Sr)TiO3 Thin Films using Inductively Coupled Plasma

Gwan Ha Kim; Kyoung Tae Kim; Dong Pyo Kim; Chang Il Kim

Articles

Page Path

유도결합 플라즈마를 이용한 PST 박막의 식각 특성

김관하, 김경태, 김동표, 김창일

Etch Characteristics of (Pb,Sr)TiO3 Thin Films using Inductively Coupled Plasma

Gwan Ha Kim, Kyoung Tae Kim, Dong Pyo Kim, Chang Il Kim

J Electr Electron Mater 2003;16(4):286-291.
Published online: April 1, 2003

5 Views
0 Download
0 Crossref
0 Scopus

prev next

Full Article

Download PDF

Keywords: PST, Etching, ICP, CF4/Ar, XPS

Cite

CITE

export

Copy Download

Format

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

RIS — For EndNote, ProCite, RefWorks, and most other reference management software
BibTeX — For JabRef, BibDesk, and other BibTeX-specific software

Include:

Citation for the content below
Citation and abstract for the content below

Etch Characteristics of (Pb,Sr)TiO3 Thin Films using Inductively Coupled Plasma

J Electr Electron Mater. 2003;16(4):286-291. Published online April 1, 2003

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

RIS — For EndNote, ProCite, RefWorks, and most other reference management software
bib — For JabRef, BibDesk, and other BibTeX-specific software

Include:

Citation for the content below
Citation and abstract for the content below

Etch Characteristics of (Pb,Sr)TiO3 Thin Films using Inductively Coupled Plasma

J Electr Electron Mater. 2003;16(4):286-291. Published online April 1, 2003

Articles

Page Path

유도결합 플라즈마를 이용한 PST 박막의 식각 특성

Etch Characteristics of (Pb,Sr)TiO3 Thin Films using Inductively Coupled Plasma

Full Article

CITE

Download Citation

Format:

Include:

Related articles

ABOUT

BROWSE ARTICLES

EDITORIAL POLICIES

FOR CONTRIBUTORS