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"FTIR"

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"FTIR"

A Study on Frequency Dependence on Dielectric Properties of Silicone Rubber Sheets
Sung Ill Lee
J Electr Electron Mater 2020;33(5):405-410.   Published online September 1, 2020
DOI: https://doi.org/10.4313/JKEM.2021.33.5.12
In this study, the following results were obtained by analysis of electric properties with FT-IR, DSC, XRD, and SEM, in the range of temperature 30~160℃ and frequency 0.1~200 kHz, when filling agent (0~100 phr) and silicone oil (0~12 phr) were added to raw silicone rubber. In the case of 100 phr mixed samples, the relative dielectric constant εr gradually decreased from 4.3 to 3.96 as frequency increased, and the dielectric loss tan δ decreased to 0.01 at 300 Hz, then increased to 0.022 at 30 kHz, then decreased to 200 kHz. The FT-IR analysis identified the same binding structure according to the chemical composition of added silica (SiO2). Through DSC analysis, we could determine the change of heat quantity and the glass transition temperature of each specimen. In the XRD analysis, it was found that the images SiO2, TiO2, and Fe2O3 appeared for specimens with 0%, 50% and 100% filling agent. Finally, the SEM analysis confirmed that particles of 0.5 to 1.5 μm size with silica (SiO2) mixing were dispersed evenly.
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Properties of SiOCH Thin Film Low Dielectric by BTMSM/O2 Flow Rates
In Cheol Park, Hong Bae Kim
J Electr Electron Mater 2009;22(2):132-136.   Published online February 1, 2009
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Properties of Dielectric Constant and Bonding Mode of Annealed SiOCH Thin Film
Jong Wook Kim, Chang Su Hwang, Yong Heon Park, Hong Bae Kim
J Electr Electron Mater 2009;22(1):47-52.   Published online January 1, 2009
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Dielectric Characteristics through 2D-correlation Analysis of SiOCH Thin Film deposited by BTMSM/O2 High Flow Rates
Min Seok Kim, Chang Su Hwang, Hong Bae Kim
J Electr Electron Mater 2008;21(6):544-551.   Published online June 1, 2008
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Properties of SiOCH Thin Film Bonding Mode by BTMSM/O2 Flow Rates
Jong Wook Kim, Chang Su Hwang, Hong Bae Kim
J Electr Electron Mater 2008;21(4):354-361.   Published online April 1, 2008
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Properties of SiOCH Thin Film Dielectric constant by BTMSM/O2 Flow Rates
Jong Wook Kim, Chang Su Hwang, Hong Bae Kim
J Electr Electron Mater 2008;21(4):362-367.   Published online April 1, 2008
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