Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
Search
Advanced Search
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Page Path

3
results for

"CF4/Ar"

Keywords

More +

Publication year

Authors

More +

"CF4/Ar"

Etching Characteristics of Gold Thin Films using Inductively Coupled CF4/Cl2/Ar Plasma
Yun Seong Chang, Dong Pyo Kim, Chang Il Kim, Eui Goo Chang
J Korean Inst Electr Electron Mater Eng 2003;16(7):564-568.   Published online July 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.7.564
  • 74 View
  • 0 Download
Surface Reactions on the Bi4-xLaxTi3O12 Thin Films Etched in Inductively Coupled CF4/Ar Plasma
Dong Pyo Kim, Kyoung Tae Kim, Chang II Kim
J Korean Inst Electr Electron Mater Eng 2003;16(5):378-384.   Published online May 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.5.378
  • 48 View
  • 0 Download
Etch Characteristics of (Pb,Sr)TiO3 Thin Films using Inductively Coupled Plasma
Gwan Ha Kim, Kyoung Tae Kim, Dong Pyo Kim, Chang Il Kim
J Korean Inst Electr Electron Mater Eng 2003;16(4):286-291.   Published online April 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.4.286
  • 50 View
  • 0 Download
First First Prev Prev
Page of 1
Next Next Last Last