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CF4/Cl2/Ar 유도 결합 플라즈마에 의한 gold 박막의 식각특성

장윤성, 김동표, 김창일, 장의구

Etching Characteristics of Gold Thin Films using Inductively Coupled CF4/Cl2/Ar Plasma

Yun Seong Chang, Dong Pyo Kim, Chang Il Kim, Eui Goo Chang
J Electr Electron Mater 2003;16(7):564-568.
Published online: July 1, 2003
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Etching Characteristics of Gold Thin Films using Inductively Coupled CF4/Cl2/Ar Plasma
J Electr Electron Mater. 2003;16(7):564-568.   Published online July 1, 2003
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Etching Characteristics of Gold Thin Films using Inductively Coupled CF4/Cl2/Ar Plasma
J Electr Electron Mater. 2003;16(7):564-568.   Published online July 1, 2003
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