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"BTMSM"

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"BTMSM"

Properties of SiOCH Thin Film Low Dielectric by BTMSM/O2 Flow Rates
In Cheol Park, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2009;22(2):132-136.   Published online February 1, 2009
DOI: https://doi.org/10.4313/JKEM.2009.22.2.132
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Properties of Dielectric Constant and Bonding Mode of Annealed SiOCH Thin Film
Jong Wook Kim, Chang Su Hwang, Yong Heon Park, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2009;22(1):47-52.   Published online January 1, 2009
DOI: https://doi.org/10.4313/JKEM.2009.22.1.047
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An Inspection of Stability for Annealing SiOCH Thin Flim
Yong Heon Park, Min Seok Kim, Chang Su Hwang, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2009;22(1):41-46.   Published online January 1, 2009
DOI: https://doi.org/10.4313/JKEM.2009.22.1.041
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Dielectric Characteristics through 2D-correlation Analysis of SiOCH Thin Film deposited by BTMSM/O2 High Flow Rates
Min Seok Kim, Chang Su Hwang, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2008;21(6):544-551.   Published online June 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.6.544
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Properties of SiOCH Thin Film Dielectric constant by BTMSM/O2 Flow Rates
Jong Wook Kim, Chang Su Hwang, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2008;21(4):362-367.   Published online April 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.4.362
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Properties of SiOCH Thin Film Bonding Mode by BTMSM/O2 Flow Rates
Jong Wook Kim, Chang Su Hwang, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2008;21(4):354-361.   Published online April 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.4.354

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  • Properties of Dielectric Constant and Bonding Mode of Annealed SiOCH Thin Film
    Jong Wook Kim, Chang Su Hwang, Yong Heon Park, Hong Bae Kim
    Journal of Korean Institute of Electrical and Electronic Materials Engineers.2009; 22(1): 47.     CrossRef
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  • 1 Crossref
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