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반도체 / 반응성 스퍼터링에 의한 AIN 박막의 증착 및 특성

김형택, 황지현, 정황희, 최성을, 박인호, 권명회

Deposition and Characteristics of AIN Tihn Films by Reactive Sputtering

Hyung Taek Kim, Ji Hyun Hwang, Hwang Hee Jung, Sung Eul Choi, In Ho Park, Myeung Hoi Kwon
J Electr Electron Mater 1999;12(8):672-678.
Published online: August 1, 1999
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Deposition and Characteristics of AIN Tihn Films by Reactive Sputtering
J Electr Electron Mater. 1999;12(8):672-678.   Published online August 1, 1999
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
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Deposition and Characteristics of AIN Tihn Films by Reactive Sputtering
J Electr Electron Mater. 1999;12(8):672-678.   Published online August 1, 1999
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