Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

Tin 이 징착된 SiO / Tin 박막의 전압 - 전류 특성

송찬일, 김창석, 정천옥, 김병인

Voltage - Current Characteristics of Thin Films of SiO / Tin Deposited TiN

Chan Il Song, Chang Suk Kim, Cung Ock Chung, Byung In Kim
J Electr Electron Mater 1999;12(2):145-150.
Published online: February 1, 1999
  • 3 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Voltage - Current Characteristics of Thin Films of SiO / Tin Deposited TiN
J Electr Electron Mater. 1999;12(2):145-150.   Published online February 1, 1999
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Voltage - Current Characteristics of Thin Films of SiO / Tin Deposited TiN
J Electr Electron Mater. 1999;12(2):145-150.   Published online February 1, 1999
Close