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RF 마그네트론 스퍼터링법에 의해 증착된 구리막의 특성

송재성, 오영우

The Properties of Copper Films Deposited by RF Magnetron Sputtering

Jae Sung Song, Young Woo Oh
J Electr Electron Mater 1996;9(7):727-732.
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The Properties of Copper Films Deposited by RF Magnetron Sputtering
J Electr Electron Mater. 1996;9(7):727-732.
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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The Properties of Copper Films Deposited by RF Magnetron Sputtering
J Electr Electron Mater. 1996;9(7):727-732.
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