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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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MIM 구조를 갖는 Al2O3/HfO2/Al2O3 캐패시터의 정합특성 분석

장재형, 권혁민, 정의정, 곽호영, 권성규, 이환희, 고성용, 이원묵, 이성재, 이희덕

Analysis of Matching Characteristics of MIM Capacitors with Al2O3/HfO2/Al2O3

Jae Hyung Jang, Hyuk Min Kwon, Yi Jung Jung, Ho Young Kwak, Sung Gyu Kwon, Hwan Hee Lee, Sungyong Go, Weon Mook Lee, Song Jae Lee, Hi Deok Lee
J Electr Electron Mater 2012;25(1):1-5.
Published online: January 1, 2012
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In this paper, matching characteristic of MIM (metal-insulator-metal) capacitor with Al2O3/HfO2/Al2O3 (AHA) structure is analyzed. The floating gate capacitance measurement technique (FGMT) was used for analysis of matching characteristic of the MIM capacitors in depth. It was shown that matching coefficient of AHA MIM capacitor is 0.331%㎛ which is appropriate for application to analog/RF integrated circuits. It was also shown that the matching coefficient has a more strong dependence on the width than length of MIM capacitor.

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Analysis of Matching Characteristics of MIM Capacitors with Al2O3/HfO2/Al2O3
J Electr Electron Mater. 2012;25(1):1-5.   Published online January 1, 2012
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Analysis of Matching Characteristics of MIM Capacitors with Al2O3/HfO2/Al2O3
J Electr Electron Mater. 2012;25(1):1-5.   Published online January 1, 2012
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