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HfO2/Hf/Si MOS 구조에서 나타나는 HfO2 박막의 물성 및 전기적 특성

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Electrical and Material Characteristics of HfO2 Film in HfO2/Hf/Si MOS Structure

Kun Ho Bae, Seung Woo Do, Jae Sung Lee, Yong Hyun Lee
J Electr Electron Mater 2009;22(2):101-106.
Published online: February 1, 2009
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Electrical and Material Characteristics of HfO2 Film in HfO2/Hf/Si MOS Structure
J Electr Electron Mater. 2009;22(2):101-106.   Published online February 1, 2009
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Electrical and Material Characteristics of HfO2 Film in HfO2/Hf/Si MOS Structure
J Electr Electron Mater. 2009;22(2):101-106.   Published online February 1, 2009
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