Effects of Cobalt Ohmic Layer on Contact Resistance

Cheong Hwee Cheong; Oh Sung Song

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코발트 오믹층의 적용에 의한 콘택저항 변화

정성희, 송오성

Effects of Cobalt Ohmic Layer on Contact Resistance

Cheong Hwee Cheong, Oh Sung Song

J Electr Electron Mater 2003;16(5):390-396.
Published online: May 1, 2003

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Keywords: Cobalt disilicide, Ti interlayer, silicide, Co/Ti bilayer, Co ohmic layer, Ti ohmic layer

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Effects of Cobalt Ohmic Layer on Contact Resistance

J Electr Electron Mater. 2003;16(5):390-396. Published online May 1, 2003

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Effects of Cobalt Ohmic Layer on Contact Resistance

J Electr Electron Mater. 2003;16(5):390-396. Published online May 1, 2003

Articles

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코발트 오믹층의 적용에 의한 콘택저항 변화

Effects of Cobalt Ohmic Layer on Contact Resistance

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