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반도체 ( Semiconductor ) : PLD 기법에 의한 Na0.5K0.5NbO3 휘발성 물질의 박막 제작 및 XRD 에 의한 c 축 배향성 확인에 관한 연구

최원석, 김장용, 장철순, 문병무

A Study on the Fabrication Na0.5K0.5NbO3 Volatile Material Thin Film by Pulsed Laser Deposition and the Confirmation of C - axis Orientation by X - Ray Diffraction

Won Seok Choe, Jang Yong Kim, Chul Soon Chang, Byung Moo Moon
J Electr Electron Mater 2001;14(4):269-273.
Published online: April 1, 2001
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A Study on the Fabrication Na0.5K0.5NbO3 Volatile Material Thin Film by Pulsed Laser Deposition and the Confirmation of C - axis Orientation by X - Ray Diffraction
J Electr Electron Mater. 2001;14(4):269-273.   Published online April 1, 2001
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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A Study on the Fabrication Na0.5K0.5NbO3 Volatile Material Thin Film by Pulsed Laser Deposition and the Confirmation of C - axis Orientation by X - Ray Diffraction
J Electr Electron Mater. 2001;14(4):269-273.   Published online April 1, 2001
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