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"Reduced pressure chemical vapor deposition"

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"Reduced pressure chemical vapor deposition"

Development of SiGe Heterostructure Epitaxial Growth and Device Fabrication Technology using Reduced Pressure Chemical Vapor Deposition
J Electr Electron Mater 2005;18(4):285-296.   Published online April 1, 2005
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Two Dimensional Boron Doping Properties in SiGe Semiconductor Epitaxial Layers Grown by Reduced Pressure Chemical Vapor Deposition
J Electr Electron Mater 2004;17(12):1301-1307.   Published online December 1, 2004
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