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Pattern selectivity
WHERE t1.sid in(parameter_dbtbl_keyword '%Pattern selectivity%') and t1.xml_status <> 99
2
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"Pattern selectivity"
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Keywords
Pattern selectivity (2)
Chemical mechanical polishing (1)
CMP (1)
Corner rounding (1)
Dishing (1)
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Publication year
2008 (1)
2005 (1)
Authors
Jae Young Choi (1)
Suk Hoon Jeong (1)
Hae Do Jeong (1)
Suk Bae Joo (1)
Jae Woo Jung (1)
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Keywords
Pattern selectivity (2)
Chemical mechanical polishing (1)
CMP (1)
Corner rounding (1)
Dishing (1)
Eros on (1)
Erosion (1)
Fixed abrasive pad (1)
microstructure pad (1)
MS pad (1)
Overpolishing (1)
shallow trench isolation (1)
STI (1)
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authors
Jae Young Choi (1)
Suk Hoon Jeong (1)
Hae Do Jeong (1)
Suk Bae Joo (1)
Jae Woo Jung (1)
Ki Hyun Park (1)
Jae Hong Park (1)
Boum Young Park (1)
Heon Deok Seo (1)
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2005 (1)
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"Pattern selectivity"
Development of Microstructure Pad and Its Performances in STI CMP
Suk Hoon Jeong, Jae Woo Jung, Ki Hyun Park, Heon Deok Seo, Jae Hong Park, Boum Young Park, Suk Bae Joo, Jae Young Choi, Hae Do Jeong
J Electr Electron Mater
2008;21(3):203-207.
Published online March 1, 2008
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Fixed Abrasive Pad with Self-conditioning in CMP Process
J Electr Electron Mater
2005;18(4):321-326.
Published online April 1, 2005
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