Skip to main navigation
Skip to main content
KIEEME
mobile search button
mobile menu button
Search
Advanced Search
ABOUT
ABOUT
Journal introduction
Aims and scope
Editorial board
Management team
Best practice
Subscription information
Contact us
BROWSE ARTICLES
All issues
Current issue
Most viewed
Most downloaded
Most cited
Search
Metrics
EDITORIAL POLICIES
Research ethics
Peer review policy
Copyright and open access policy
Article sharing policy
Archiving policy
Data sharing policy
Preprint policy
Crossmark policy
Advertising and sponsorship policy
Research misconduct-related regulations
FOR CONTRIBUTORS
Instructions for authors
Checklist
Copyright transfer agreement
Graphical abstract
E-SUBMISSION
Article Template
ABOUT
Journal introduction
Aims and scope
Editorial board
Management team
Best practice
Subscription information
Contact us
BROWSE ARTICLES
All issues
Current issue
Most viewed
Most downloaded
Most cited
Search
Metrics
EDITORIAL POLICIES
Research ethics
Peer review policy
Copyright and open access policy
Article sharing policy
Archiving policy
Data sharing policy
Preprint policy
Crossmark policy
Advertising and sponsorship policy
Research misconduct-related regulations
FOR CONTRIBUTORS
Instructions for authors
Checklist
Copyright transfer agreement
Graphical abstract
Page Path
HOME
Search
Oxide charge
WHERE t1.sid in(parameter_dbtbl_keyword '%Oxide charge%') and t1.xml_status <> 99
2
results for
"Oxide charge"
Filter
Keywords
ALD (1)
Atomic Layer deposition (1)
Boron penetration (1)
Fixed oxide charge (Qf) (1)
Hf (1)
More +
Publication year
2009 (1)
2007 (1)
Authors
Kun Ho Bae (1)
Seung Woo Do (1)
Jae Sung Lee (1)
Yong Hyun Lee (1)
Keywords
ALD (1)
Atomic Layer deposition (1)
Boron penetration (1)
Fixed oxide charge (Qf) (1)
Hf (1)
HfO2 (1)
Interface trap charge (Qit) (1)
Nano CMOSFET (1)
NBTI (1)
Negative bias temperature instability (1)
Oxide charge (1)
Plasma nitrided oxide (1)
SiO(x) Layer (1)
Cancel
Close
authors
Kun Ho Bae (1)
Seung Woo Do (1)
Jae Sung Lee (1)
Yong Hyun Lee (1)
Cancel
Close
Publication Year
2009 (1)
2007 (1)
Cancel
Close
Funded articles
Cancel
Close
"Oxide charge"
Electrical and Material Characteristics of HfO2 Film in HfO2/Hf/Si MOS Structure
Kun Ho Bae, Seung Woo Do, Jae Sung Lee, Yong Hyun Lee
J Korean Inst Electr Electron Mater Eng
2009;22(2):101-106.
Published online February 1, 2009
DOI:
https://doi.org/10.4313/JKEM.2009.22.2.101
PDF
62
View
0
Download
Dependency of the Device Characteristics on Plasma Nitrided Oxide for Nano-scale PMOSFET
J Korean Inst Electr Electron Mater Eng
2007;20(7):569-574.
Published online July 1, 2007
DOI:
https://doi.org/10.4313/JKEM.2007.20.7.569
PDF
64
View
0
Download
First
Prev
Page
of 1
Next
Last
×
TOP
First
Prev
