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Oxide charge
WHERE t1.sid in(parameter_dbtbl_keyword '%Oxide charge%') and t1.xml_status <> 99
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"Oxide charge"
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ALD (1)
Atomic Layer deposition (1)
Boron penetration (1)
Fixed oxide charge (Qf) (1)
Hf (1)
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2007 (1)
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Kun Ho Bae (1)
Seung Woo Do (1)
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Yong Hyun Lee (1)
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Atomic Layer deposition (1)
Boron penetration (1)
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Hf (1)
HfO2 (1)
Interface trap charge (Qit) (1)
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"Oxide charge"
Electrical and Material Characteristics of HfO2 Film in HfO2/Hf/Si MOS Structure
Kun Ho Bae, Seung Woo Do, Jae Sung Lee, Yong Hyun Lee
J Electr Electron Mater
2009;22(2):101-106.
Published online February 1, 2009
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Dependency of the Device Characteristics on Plasma Nitrided Oxide for Nano-scale PMOSFET
J Electr Electron Mater
2007;20(7):569-574.
Published online July 1, 2007
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