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"FBAR"

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"FBAR"

Characteristics of ZnO Thin Films of FBAR using ALD and RE Magnetron Sputtering
J Korean Inst Electr Electron Mater Eng 2005;18(2):164-168.   Published online February 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.2.164
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Characteristics of ZnO Thin Film for SMR-typed FBAR Fabrication
J Korean Inst Electr Electron Mater Eng 2005;18(2):159-163.   Published online February 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.2.159
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A Study on the Deposition Characteristics of ZnO Piezoelectric Thin Film Bulk Acoustic Resonator
Seung Hyeog Choe, Jong Seong Kim
J Korean Inst Electr Electron Mater Eng 2003;16(8):716-722.   Published online August 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.8.716
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A Study of the Crystallographic Properties of ZnO/SiO2/Si Thin Film for FBAR
Min Jong Geum, In Hwan Son, Myeong Gyu Choe, Sun Nam Chu, Hyeong Ug Choe, Yeong Hwa Sin, Gyeong Hwan Kim
J Korean Inst Electr Electron Mater Eng 2003;16(8):711-715.   Published online August 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.8.711
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Monolithic Film Bulk Acoustic Wave Resonator using SOI Wafer
In Tae Kim, Yun Kwon Park, Si Hyung Lee, Yun Hi Lee, Jeon Kook Lee, Nam Soo Kim, Byeong Kwon Ju
J Korean Inst Electr Electron Mater Eng 2002;15(12):1039-1044.   Published online December 1, 2002
DOI: https://doi.org/10.4313/JKEM.2002.15.12.1039
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Design and Fabrication of Film Bulk Acoustic Resonator for Flexible Microsystems
Yu Li Kang, Yong Gug Kim, Su Won Kim, Byeong Gwon Ju
J Korean Inst Electr Electron Mater Eng 2003;16(12s):1224-1231.
DOI: https://doi.org/10.4313/JKEM.2003.16.12s.1224
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