Characteristics of ZnO Thin Films of FBAR using ALD and RE Magnetron Sputtering

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ALD와 RE 마그네트론 스퍼터링을 이용한 FBAR 소자의 ZnO 박막증착 및 특성

신영화, 권상직, 윤영수

Characteristics of ZnO Thin Films of FBAR using ALD and RE Magnetron Sputtering

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J Electr Electron Mater 2005;18(2):164-168.
Published online: February 1, 2005

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Keywords: ZnO, 2-step deposition, Film bulk acoustic resonator, FBAR, Atomic Layer deposition, ALD, RF magnetron sputtering

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Characteristics of ZnO Thin Films of FBAR using ALD and RE Magnetron Sputtering

J Electr Electron Mater. 2005;18(2):164-168. Published online February 1, 2005

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Characteristics of ZnO Thin Films of FBAR using ALD and RE Magnetron Sputtering

J Electr Electron Mater. 2005;18(2):164-168. Published online February 1, 2005

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ALD와 RE 마그네트론 스퍼터링을 이용한 FBAR 소자의 ZnO 박막증착 및 특성

Characteristics of ZnO Thin Films of FBAR using ALD and RE Magnetron Sputtering

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