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"CMOSFET"

Dependence of Device Performance and Reliability on Chanel Direction in PMOSFET`s: Jung Deuk Bok, Ye Ji Park, In Shik Han, Hyuk Min Kwon, Byoung Seok Park, Sang Uk Park, Min Gyu Lim, Yi Sun Chung, Jung Hwan Lee, Hi Deok Lee; J Electr Electron Mater 2010;23(6):431-435. Published online June 1, 2010

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Thermal Stability Improvement of Ni-Suicide using Ni-Co alloy for Nano-scale CMOSFET: J Electr Electron Mater 2008;21(1):18-22. Published online January 1, 2008

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Dependency of the Device Characteristics on Plasma Nitrided Oxide for Nano-scale PMOSFET: J Electr Electron Mater 2007;20(7):569-574. Published online July 1, 2007

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Improving the Thermal Stability of Ni-silicide using Ni-V on Boron Cluster Implanted Source/drain for Nano-scale CMOSFETs: J Electr Electron Mater 2007;20(6):487-490. Published online June 1, 2007

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Dependence of Low-frequency Noise and Device Characteristics on Initial Oxidation Method of Plasma-nitride Oxide for Nano-scale CMOSFET: J Electr Electron Mater 2007;20(1):1-7. Published online January 1, 2007

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Thermal Stability Improvement of Ni-Silicide on the SOI Substrate Doped B11 for Nano-scale CMOSFET: J Electr Electron Mater 2006;19(11):1000-1004. Published online November 1, 2006

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A Stacked Polusilicon Strucutre by Nitridation in N2 Atmosphere for Nano-scale CMOSFETs: J Electr Electron Mater 2005;18(11):1001-1006. Published online November 1, 2005

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