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비정질 실리콘에서 인의 토핑과 이온주입에 따른 농도분포에 대한 연구

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A Study of Concentration Profiles in Amorphous Silicon by Phosphorus Doping and Ion Implantatiion

Won Chae Jung
J Electr Electron Mater 1999;12(1):18-26.
Published online: January 1, 1999
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A Study of Concentration Profiles in Amorphous Silicon by Phosphorus Doping and Ion Implantatiion
J Electr Electron Mater. 1999;12(1):18-26.   Published online January 1, 1999
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
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A Study of Concentration Profiles in Amorphous Silicon by Phosphorus Doping and Ion Implantatiion
J Electr Electron Mater. 1999;12(1):18-26.   Published online January 1, 1999
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