A Study on the High SelectiveOxide Etching using Inductively Coupled Plasma Source

Soo Boo Lee; Hun Gun Park; Seok Hyun Lee

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유도결합형 플라즈마원을 이용한 고선택비 산화막 식각에 관한 연구

이수부, 박헌건, 이석현

A Study on the High SelectiveOxide Etching using Inductively Coupled Plasma Source

Soo Boo Lee, Hun Gun Park, Seok Hyun Lee

J Electr Electron Mater 1998;11(4):261-266.
Published online: April 1, 1998

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A Study on the High SelectiveOxide Etching using Inductively Coupled Plasma Source

J Electr Electron Mater. 1998;11(4):261-266. Published online April 1, 1998

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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A Study on the High SelectiveOxide Etching using Inductively Coupled Plasma Source

J Electr Electron Mater. 1998;11(4):261-266. Published online April 1, 1998

Articles

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유도결합형 플라즈마원을 이용한 고선택비 산화막 식각에 관한 연구

A Study on the High SelectiveOxide Etching using Inductively Coupled Plasma Source

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