Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

전기 열량 소자로의 응용을 위한 K(Ta0.70Nb0.30)O₃/K(Ta0.55Nb0.45)O₃ 이종층 박막의 구조적, 전기적 특성

박병준, 육지수, 이삼행, 이명규, 박주석, 이성갑

Structural and Electrical Properties of K(Ta0.70Nb0.30)O₃/K(Ta0.55Nb0.45)O₃ Heterolayer Thin Films for Electrocaloric Devices

Byeong-jun Park, Ji-su Yuk, Sam-haeng Yi, Myung-gyu Lee, Joo-seok Park, Sung-gap Lee
J Electr Electron Mater 2024;37(3):297-303.
Published online: May 1, 2024
  • 10 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

In this study, KTN heterolayer thin films were fabricated by alternately stacking films of K(Ta0.70Nb0.30)O3 and K(Ta0.55Nb0.45)O3 synthesized using the sol-gel method. The sintering temperature and time were 750℃ and 1 hour, respectively. All specimens exhibited a polycrystalline pseudo-cubic crystal structure, with a lattice constant of approximately 0.398 nm. The average grain size was around 130~150 nm, indicating relatively uniform sizes regardless of the number of coatings. The average thickness of a single-coated film was approximately 70 nm. The phase transition temperature of the KTN heterolayer films was found to be approximately 8~12℃. Moreover, the 6-coated KTN heterolayer film displayed an excellent dielectric constant of about 11,000. As the number of coatings increased, and consequently the film thickness, the remanent polarization increased, while the coercive field decreased. The 6-coated KTN heterolayer film exhibited a remanent polarization and coercive field of 11.4 μC/cm2 and 69.3 kV/cm at room temperature, respectively. ΔT showed the highest value at a temperature slightly above the Curie temperature, and for the 6-coated KTN heterolayer film, the ΔT and ΔT/ΔE were approximately 1.93 K and 0.128×10-6 K·m/V around 40℃, respectively.

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Structural and Electrical Properties of K(Ta0.70Nb0.30)O₃/K(Ta0.55Nb0.45)O₃ Heterolayer Thin Films for Electrocaloric Devices
J Electr Electron Mater. 2024;37(3):297-303.   Published online May 1, 2024
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Structural and Electrical Properties of K(Ta0.70Nb0.30)O₃/K(Ta0.55Nb0.45)O₃ Heterolayer Thin Films for Electrocaloric Devices
J Electr Electron Mater. 2024;37(3):297-303.   Published online May 1, 2024
Close