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L/L 진공시스템을 이용한 적층캐패시터의 하층산화막 박막화에 대한 연구

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A Study on the Botton Oxide Scaling for Dielectric in Stacked Capacitor Using L/L Vacuum System

Yang Hee Joung, Myoung Kyu Kim
J Electr Electron Mater 1996;9(5):476-482.
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A Study on the Botton Oxide Scaling for Dielectric in Stacked Capacitor Using L/L Vacuum System
J Electr Electron Mater. 1996;9(5):476-482.
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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A Study on the Botton Oxide Scaling for Dielectric in Stacked Capacitor Using L/L Vacuum System
J Electr Electron Mater. 1996;9(5):476-482.
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