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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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고정렬 Pt 라인 및 크로스-바 미세패턴의 구조적 안정성 연구

박태완, 박운익

Structural Stability for Pt Line and Cross-Bar Sub-Micron Patterns

Tae Wan Park, Woon Ik Park
J Electr Electron Mater 2018;31(7):510-514.
Published online: November 1, 2018
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This study discusses and demonstrates the structural stability of highly ordered Pt patterns formed on a transparent and flexible substrate through the process of nanotransfer printing (nTP). Bending tests comprising approximately 1,000 cycles were conducted for observing Pt line patterns with a width of 1 μm formed along the direction of the horizontal (x-axis) and vertical (y-axis) axes (15 mm × 15 mm); and adhesion tests were performed with an ultrasonicator for a period greater than ten minutes, to analyze the Pt crossbar patterns. The durability of both types of patterns was systematically analyzed by employing various microscopes. The results show that the Pt line and Pt crossbar patterns obtained through nTP are structurally stable and do not exhibit any cracks, breaks, or damages. These results corroborate that nTP is a promising nanotechnology that can be applied to flexible electronic devices. Furthermore, the multiple patterns obtained through nTP can improve the working performance of flexible devices by providing excellent structural stability.

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Structural Stability for Pt Line and Cross-Bar Sub-Micron Patterns
J Electr Electron Mater. 2018;31(7):510-514.   Published online November 1, 2018
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Structural Stability for Pt Line and Cross-Bar Sub-Micron Patterns
J Electr Electron Mater. 2018;31(7):510-514.   Published online November 1, 2018
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