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E-빔 증착된 Sn 전구체의 황화 열처리 온도 및 시간에 따른 SnSx 박막 성장 효과

황팅지엔, 김제하

Effect of the Sulfurization Temperature and Annealing Time of E-Beam Evaporated Sn Precursors on the Growth of SnSx Thin Films

Tingjian Huang, Jeha Kim
J Electr Electron Mater 2017;30(11):734-739.
Published online: November 1, 2017
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We prepared SnSx thin films on both soda-lime glass (SLG) and molybdenum(Mo)/SLG substrates by a two-step process using a Sn precursor followed by sulfur reaction in rapid thermal annealing (RTA) at different sulfurization temperatures (Ts = 200℃, 230℃, 250℃, and 300℃) and annealing times (ts = 10 min and 30 min). The single SnS phase was dominant for 200℃≤Ts<250℃, while an additional phase of SnS2 was appeared at Ts≥250℃ alongside SnS. The SnS grains in all the samples showed strong growth along the preferred [040] direction. The band-gap energy (Eg) of the films was estimated to be 1.24 eV.

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Effect of the Sulfurization Temperature and Annealing Time of E-Beam Evaporated Sn Precursors on the Growth of SnSx Thin Films
J Electr Electron Mater. 2017;30(11):734-739.   Published online November 1, 2017
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Include:
Effect of the Sulfurization Temperature and Annealing Time of E-Beam Evaporated Sn Precursors on the Growth of SnSx Thin Films
J Electr Electron Mater. 2017;30(11):734-739.   Published online November 1, 2017
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