Characteristics of Oxynitride Films grown by PECVD using N2O Gas

Hyun Sik Choi; Cheol In Lee; Eui Goo Chang

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N2O 가스를 사용하여 PECVD 로 성장된 Oxynitride 막의 특성

최현식, 이철인, 장의구

Characteristics of Oxynitride Films grown by PECVD using N2O Gas

Hyun Sik Choi, Cheol In Lee, Eui Goo Chang

J Electr Electron Mater 1996;9(1):9-16.

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Characteristics of Oxynitride Films grown by PECVD using N2O Gas

J Electr Electron Mater. 1996;9(1):9-16.

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Characteristics of Oxynitride Films grown by PECVD using N2O Gas

J Electr Electron Mater. 1996;9(1):9-16.

Articles

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N2O 가스를 사용하여 PECVD 로 성장된 Oxynitride 막의 특성

Characteristics of Oxynitride Films grown by PECVD using N2O Gas

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