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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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PMOSFET의 채널 길이에 따른 NBTI 스트레스와 CHC 스트레스의 신뢰성 특성 비교 분석

유재남, 권성규, 신종관, 오선호, 장성용, 송형섭, 이가원, 이희덕

Comparative Analysis of Channel Length Dependence of NBTI and CHC Characteristics in PMOSFETs

Jae Nam Yu, Sung Kyu Kwon, Jong Kwan Shin, Sun Ho Oh, Sung Yong Jang, Hyung Sub Song, Ga Won Lee, Hi Deok Lee
J Electr Electron Mater 2014;27(7):438-442.
Published online: July 1, 2014
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채널 길이가 줄어듦에 따른 PMOSFET에서의 NBTI (negative bias temperature instablilty) and CHC (channel hot carrier) 특성을 연구하였다. PMOSFET에서 핫캐리어 스트레스 이후의 수명이 NBTI 스트레스 이후의 수명보다 더 크다고 보고되어 왔다. 하지만 채널 길이가 짧은 PMOFET에서 NBTI 스트레스에 따른 열화보다 CHC 스트레스에 따른 열화가 더 크게 나타났다. 이러한 여화 특성을 분석하기 위해 플리커 잡음과 전하 펌핑 기술이 사용되었다.

Channel length dependence of NBTI (negative bias temperature instablilty) and CHC (channel hot carrier) characteristics in PMOSFET is studied. It has been considered that HC lifetime of PMOSFET is larger than NBTI lifetime. However, it is shown that CHC degradation is greater than NBTI degradation for PMOSFET with short channel length. 1/f noise and charge pumping measurement are used for analysis of these degradations.

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Comparative Analysis of Channel Length Dependence of NBTI and CHC Characteristics in PMOSFETs
J Electr Electron Mater. 2014;27(7):438-442.   Published online July 1, 2014
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Comparative Analysis of Channel Length Dependence of NBTI and CHC Characteristics in PMOSFETs
J Electr Electron Mater. 2014;27(7):438-442.   Published online July 1, 2014
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