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간접천이대를 갖는 2차원 소자에서 성장방향에 따른Hall 인수의 이방성 연구

김종구, 이재철, 전상국

Anisotropy of the Hall Factor According to the Growth Direction in the Two-dimensional Device with Indirect Conduction Valley

Jong Gu Kim, Jae Chul Lee, Sang Kook Chun
J Electr Electron Mater 2014;27(7):428-432.
Published online: July 1, 2014
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간접천이대를 갖는 2차원 구조의 소자에서 성장방향과 응력조건에 따른 홀인수를 계산하였다. [001] 또는 [111] 성장방향의 경우, 평면상에서 2차원 일정에너지표면의 분포는 등방성을 띈다. 하지만 [110] 성장방향의 경우, 점유된 밸리의 분포는 더 이상 등방성을 띄지 못한다. 이러한 결과는 샘플 평면상에서 홀인수의 이방성의 원인이 된다.

The Hall factor in a two-dimensional device with indirect conduction valleys is calculated for several growth on various strain conditions. In the [001] or [111] growth direction, the two-dimensional constant energy surfaces of occupied valleys are shown to be isotropic ally distributed. However, in the [110] growth direction, the distribution of occupied valleys on the plane is not isotropic. This fact is the reason for the anisotropic Hall factor on the sample plane.

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Anisotropy of the Hall Factor According to the Growth Direction in the Two-dimensional Device with Indirect Conduction Valley
J Electr Electron Mater. 2014;27(7):428-432.   Published online July 1, 2014
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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Anisotropy of the Hall Factor According to the Growth Direction in the Two-dimensional Device with Indirect Conduction Valley
J Electr Electron Mater. 2014;27(7):428-432.   Published online July 1, 2014
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