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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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반도체 : Cr-SrTiO3 박막을 이용한 Si 기반 1D 형태 저항 변화 메모리의 전류-전압 특성 고찰

송민영, 서유정, 김연수, 김희동, 안호명, 김태근

Regular Paper : Semiconductor ; Current Versus Voltage Characteristics of a Si Based 1-Diode Type Resistive Memory with Cr-SrTiO3 Films

Min Yeong Song, Yu Jeong Seo, Yeon Soo Kim, Hee Dong Kim, Ho Myoung An, Tae Geun Kim
J Electr Electron Mater 2011;24(11):855-858.
Published online: November 1, 2011
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In this paper, in order to suppress unwanted current paths originating from adjacent cells in a passive crossbar array based on resistive random access memory (RRAM) without extrinsic switching devices, 1-diode type RRAM which consists of a 0.2% chromium-doped strontium titanate (Cr-SrTiO3) film deposited on a silicon substrate, was proposed for high packing density, and intrinsic rectifying characteristics from the current versus voltage characteristics were successfully demonstrated.

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Regular Paper : Semiconductor ; Current Versus Voltage Characteristics of a Si Based 1-Diode Type Resistive Memory with Cr-SrTiO3 Films
J Electr Electron Mater. 2011;24(11):855-858.   Published online November 1, 2011
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Regular Paper : Semiconductor ; Current Versus Voltage Characteristics of a Si Based 1-Diode Type Resistive Memory with Cr-SrTiO3 Films
J Electr Electron Mater. 2011;24(11):855-858.   Published online November 1, 2011
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