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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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반도체 : Al2O3 게이트 절연막을 이용한 GaN Power MOSFET의 설계에 관한 연구

남태진, 정헌석, 강이구

Regular Paper : Semiconductor ; Optimal Design of GaN Power MOSFET Using Al2O3 Gate Oxide

Tae Jin Nam, Hun Suk Chung, Ey Goo Kang
J Electr Electron Mater 2011;24(9):713-717.
Published online: September 1, 2011
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This paper was carried out design of 600 V GaN power MOSFET Modeling. We decided trench gate type one for design. we carried out device and process simulation with T-CAD tools. and then, we have extracted optimal device and process parameters for fabrication. we have analysis electrical characteristics after simulations. As results, we obtained 600 V breankdown voltage and 0.4 mΩcm2ultra low on resistance. At the same time, we carried out field ring simulation for obtaining high voltage.

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Regular Paper : Semiconductor ; Optimal Design of GaN Power MOSFET Using Al2O3 Gate Oxide
J Electr Electron Mater. 2011;24(9):713-717.   Published online September 1, 2011
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Regular Paper : Semiconductor ; Optimal Design of GaN Power MOSFET Using Al2O3 Gate Oxide
J Electr Electron Mater. 2011;24(9):713-717.   Published online September 1, 2011
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