The Resistivity Properties of Tungsten Nitride Films Deposited by RF Sputtering

Woo Sun Lee; Yong Ho Chung; Sang Il Lee

Articles

Page Path

RF 스퍼터링 증착에 의한 질화 텅스텐 박막의 비저항 특성

이우선, 정용호, 이상일

The Resistivity Properties of Tungsten Nitride Films Deposited by RF Sputtering

Woo Sun Lee, Yong Ho Chung, Sang Il Lee

J Electr Electron Mater 1995;8(2):196-203.

4 Views
0 Download
0 Crossref
0 Scopus

prev next

Full Article

Download PDF

Cite

CITE

export

Copy Download

Format

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

RIS — For EndNote, ProCite, RefWorks, and most other reference management software
BibTeX — For JabRef, BibDesk, and other BibTeX-specific software

Include:

Citation for the content below
Citation and abstract for the content below

The Resistivity Properties of Tungsten Nitride Films Deposited by RF Sputtering

J Electr Electron Mater. 1995;8(2):196-203.

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

RIS — For EndNote, ProCite, RefWorks, and most other reference management software
bib — For JabRef, BibDesk, and other BibTeX-specific software

Include:

Citation for the content below
Citation and abstract for the content below

The Resistivity Properties of Tungsten Nitride Films Deposited by RF Sputtering

J Electr Electron Mater. 1995;8(2):196-203.

Articles

Page Path

RF 스퍼터링 증착에 의한 질화 텅스텐 박막의 비저항 특성

The Resistivity Properties of Tungsten Nitride Films Deposited by RF Sputtering

Full Article

CITE

Download Citation

Format:

Include:

Related articles

ABOUT

BROWSE ARTICLES

EDITORIAL POLICIES

FOR CONTRIBUTORS