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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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Tungsten Carbide 표면에 코팅된 Re-Ir 박막의 표면 특성

이호식, 천민우, 박용필

Regular Paper : Surface Properties of Re-Ir Coating Thin Film on Tungsten Carbide Surface

Ho Shik Lee, Min Woo Cheon, Yong Pil Park
J Electr Electron Mater 2011;24(3):219-223.
Published online: March 1, 2011
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Rhenium-Iridium(Re-Ir) thin films were deposited onto the tungsten carbide(WC) molding core by sputtering system. The Re-Ir films were prepared by multi-target sputtering with iridium, rhenium and chromium as the sources. Argon and nitrogen were inlet into the chamber to be the plasma and reactive gases. The Re-Ir thin films were prepared with targets having atomic percent of 3:7 and the Re-Ir thin films were formed with 240 nm thickness. The Re-Ir thin films on tungsten carbide molding core were analyzed by scanning electron microscope(SEM) and surface roughness. Also, adhesion strength and coefficient friction of Re-Ir thin film were examined. The Re-Ir coating technique has been intensive efforts in the field of coating process because the coating technique and process have been their feature, like hardness, high elasticity, abrasion resistance and mechanical stability and also have been applied widely the industrial and biomedical areas. In this report, tungsten carbide(WC) molding core was manufactures using high performance precision machining and the efforts of Re-Ir coating on the surface roughness.

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Regular Paper : Surface Properties of Re-Ir Coating Thin Film on Tungsten Carbide Surface
J Electr Electron Mater. 2011;24(3):219-223.   Published online March 1, 2011
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Regular Paper : Surface Properties of Re-Ir Coating Thin Film on Tungsten Carbide Surface
J Electr Electron Mater. 2011;24(3):219-223.   Published online March 1, 2011
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