Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
Search
Advanced Search
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

Page Path

인라인 스퍼터 시스템을 이용한 공정 압력의 변화에 따른 PC 기판상의 ITO 박막특성에 관한 연구

안민형, 조의식, 권상직

Characteristics of ITO Thin Films Sputtered on Polycarbonate substrates at Various Pressures By In-Line Sputter

Min Hyung Ahn, Eui Sik Cho, Sang Jik Kwon
J Electr Electron Mater 2009;22(9):772-775.
Published online: September 1, 2009
  • 6 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Full Article

Download PDF Download PDF

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Characteristics of ITO Thin Films Sputtered on Polycarbonate substrates at Various Pressures By In-Line Sputter
J Electr Electron Mater. 2009;22(9):772-775.   Published online September 1, 2009
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
Format:
Include:
Characteristics of ITO Thin Films Sputtered on Polycarbonate substrates at Various Pressures By In-Line Sputter
J Electr Electron Mater. 2009;22(9):772-775.   Published online September 1, 2009
Close

Related articles

ABOUT

BROWSE ARTICLES

EDITORIAL POLICIES

FOR CONTRIBUTORS

© The Korean Institute of Electrical and Electronic Materials Engineers.