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Programmable Metallization Cell 응용을 위한 Ag-doped 칼코게나이드 박막의 전기적 저항 변화 특성

최혁, 구상모, 조원주, 이영희, 정홍배

Properties on Electrical Resistance Change of Ag-doped Chalcogenide Thin Films Application for Programmable Metallization Cell

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J Electr Electron Mater 2007;20(12):1022-1026.
Published online: December 1, 2007
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Properties on Electrical Resistance Change of Ag-doped Chalcogenide Thin Films Application for Programmable Metallization Cell
J Electr Electron Mater. 2007;20(12):1022-1026.   Published online December 1, 2007
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Include:
Properties on Electrical Resistance Change of Ag-doped Chalcogenide Thin Films Application for Programmable Metallization Cell
J Electr Electron Mater. 2007;20(12):1022-1026.   Published online December 1, 2007
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