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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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UV/O2 가스상 세정을 이용한 실리콘 웨이퍼상의 PEG 반응기구의 관찰

권성구, 김도현, 김기동, 이승헌

Investigation of PEG (polyethyleneglycol) Removal Mechanism during UV/O2 Gas Phase Cleaning for Silicon Technology

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J Electr Electron Mater 2006;19(11):985-993.
Published online: November 1, 2006
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Investigation of PEG (polyethyleneglycol) Removal Mechanism during UV/O2 Gas Phase Cleaning for Silicon Technology
J Electr Electron Mater. 2006;19(11):985-993.   Published online November 1, 2006
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Investigation of PEG (polyethyleneglycol) Removal Mechanism during UV/O2 Gas Phase Cleaning for Silicon Technology
J Electr Electron Mater. 2006;19(11):985-993.   Published online November 1, 2006
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