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N2O 가스로 재산화시킨 oxynitride 막의 특성

김태형, 김창일, 최동진, 장의구

Properties of the oxynitride films formed by thermal reoxidation in N2O gas

Tae Hyung Kim, Chang Il Kim, Dong Jin Choi, Eui Goo Chang
J Electr Electron Mater 1994;7(1):25-31.
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Properties of the oxynitride films formed by thermal reoxidation in N2O gas
J Electr Electron Mater. 1994;7(1):25-31.
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Properties of the oxynitride films formed by thermal reoxidation in N2O gas
J Electr Electron Mater. 1994;7(1):25-31.
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