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Decoupled Plasma Nitridation 공정 적용을 통한 Negative Bias Temperature Instability 특성 개선

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Improvement of Negative Bias Temperature Instability by Decoupled Plasma Nitridation Process

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J Electr Electron Mater 2005;18(10):883-890.
Published online: October 1, 2005
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Improvement of Negative Bias Temperature Instability by Decoupled Plasma Nitridation Process
J Electr Electron Mater. 2005;18(10):883-890.   Published online October 1, 2005
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Improvement of Negative Bias Temperature Instability by Decoupled Plasma Nitridation Process
J Electr Electron Mater. 2005;18(10):883-890.   Published online October 1, 2005
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