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고온에서 반도체에 인을 도핑하기 위한 새로운 고체 판상 원료에 관한 연구

김영식, 신방섭

A Study on the New Solid Planar Source for High - Temperature Phosphorus Doping of Semiconductors

Y . S . Kim, B . S . Shin
J Electr Electron Mater 1993;6(3):214-219.
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A Study on the New Solid Planar Source for High - Temperature Phosphorus Doping of Semiconductors
J Electr Electron Mater. 1993;6(3):214-219.
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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A Study on the New Solid Planar Source for High - Temperature Phosphorus Doping of Semiconductors
J Electr Electron Mater. 1993;6(3):214-219.
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