SIH4 Soak Effects in the W plug CVD Process

Woo Sun Lee; Yong Jin Seo; Sang Yong Kim; Jin Seung Park

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텅스텐 플러그 CVD 공정에서 SIH4 Soak의 영향

이우선, 서용진, 김상용, 박진성

SIH4 Soak Effects in the W plug CVD Process

Woo Sun Lee, Yong Jin Seo, Sang Yong Kim, Jin Seung Park

J Electr Electron Mater 2003;16(1):1-4.
Published online: January 1, 2003

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Keywords: SiH4 soak, Tungsten (W) plug, Chemical vapor deposition, Ti/TIN barrier metal, WF6 attack, Via contact resistance

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SIH4 Soak Effects in the W plug CVD Process

J Electr Electron Mater. 2003;16(1):1-4. Published online January 1, 2003

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SIH4 Soak Effects in the W plug CVD Process

J Electr Electron Mater. 2003;16(1):1-4. Published online January 1, 2003

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텅스텐 플러그 CVD 공정에서 SIH4 Soak의 영향

SIH4 Soak Effects in the W plug CVD Process

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