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Ar/CF4 유도결합 플라즈마를 이용한 (Ba0.6Sr0.4)TiO3 박막의 식각 특성

강필승, 김경태, 김동표, 김창일, 이수재

The Etching Characteristics of (Ba0.6Sr0.4)TiO3 Films using Ar/CF4 Inductively Coupled Plasma

Pil Seung Kang, Kyoung Tae Kim, Dong Pyo Kim, Chang Il Kim, Su Jae Lee
J Electr Electron Mater 2002;15(11):933-938.
Published online: November 1, 2002
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The Etching Characteristics of (Ba0.6Sr0.4)TiO3 Films using Ar/CF4 Inductively Coupled Plasma
J Electr Electron Mater. 2002;15(11):933-938.   Published online November 1, 2002
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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The Etching Characteristics of (Ba0.6Sr0.4)TiO3 Films using Ar/CF4 Inductively Coupled Plasma
J Electr Electron Mater. 2002;15(11):933-938.   Published online November 1, 2002
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