Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

CMP 공정에서 마이크로 스크래치 감소를 위한 슬러리 필터의 특성

김철복, 김상용, 서용진

Characteristics of Slurry Filter for Reduction of CMP Slurry - induced Micro - scratch

Chul Bok Kim, Sang Yong Kim, Yong Jin Seo
J Electr Electron Mater 2001;14(7):557-561.
Published online: July 1, 2001
  • 6 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Characteristics of Slurry Filter for Reduction of CMP Slurry - induced Micro - scratch
J Electr Electron Mater. 2001;14(7):557-561.   Published online July 1, 2001
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Characteristics of Slurry Filter for Reduction of CMP Slurry - induced Micro - scratch
J Electr Electron Mater. 2001;14(7):557-561.   Published online July 1, 2001
Close