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탈이온수의 압력과 정제된 N2 가스가 ILD - CMP 공정에 미치는 영향

김상용, 이우선, 서용진, 김창일, 장의구, 박진성

Influence of DI Water Pressure and Purified N2 Gas on the Inter Level Dielectric - Chemical Mechanical Polishing Process

Sang Yong Kim, Woo Sun Lee, Yong Jin Seo, Chang Il Kim, Eui Goo Chang, Jin Sung Park
J Electr Electron Mater 2000;13(10):812-816.
Published online: October 1, 2000
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Influence of DI Water Pressure and Purified N2 Gas on the Inter Level Dielectric - Chemical Mechanical Polishing Process
J Electr Electron Mater. 2000;13(10):812-816.   Published online October 1, 2000
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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Influence of DI Water Pressure and Purified N2 Gas on the Inter Level Dielectric - Chemical Mechanical Polishing Process
J Electr Electron Mater. 2000;13(10):812-816.   Published online October 1, 2000
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